Fukuoka-ken, Japan

Yoshichika Tokuno


Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Tosu, JP (2010)
  • Fukuoka-Ken, JP (2012)

Company Filing History:


Years Active: 2010-2012

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2 patents (USPTO):Explore Patents

Title: The Innovations of Yoshichika Tokuno

Introduction

Yoshichika Tokuno is a notable inventor based in Fukuoka-ken, Japan. He has made significant contributions to the field of substrate processing and ozone processing technologies. With a total of two patents to his name, Tokuno's work focuses on improving efficiency and reducing costs in substrate processing methods.

Latest Patents

Tokuno's latest patents include a substrate processing method and an ozone processing apparatus. The substrate processing method aims to prevent the generation of watermarks on substrates while being cost-effective. This method involves controlling the ambient humidity around the substrate based on the type of chemical liquid used during processing. Specifically, humidity control is crucial during the drying step, especially when using a fluid containing isopropyl alcohol (IPA) as a drying agent.

The ozone processing apparatus patent describes a method where water vapor is mixed with ozone gas generated by a discharge-type ozone generator. This mixed fluid is then cooled, allowing impurities such as metals and nitrogen oxides to dissolve into condensed water. A gas-liquid separator is employed to separate the ozone gas from the condensed water, and the mixed fluid is passed through a metal trap containing silicon chips to remove any remaining metals.

Career Highlights

Yoshichika Tokuno is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at Tokyo Electron has allowed him to develop innovative solutions that enhance substrate processing techniques.

Collaborations

Throughout his career, Tokuno has collaborated with esteemed colleagues such as Hiroshi Nagayasu and Norihiro Ito. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

Yoshichika Tokuno's contributions to substrate processing and ozone processing technologies highlight his innovative spirit and dedication to improving manufacturing processes. His patents reflect a commitment to efficiency and cost-effectiveness in the industry.

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