Yoshiaki Ogiso

Title: Yoshiaki Ogiso: Innovator in Pattern Inspection Technologies

Introduction

Yoshiaki Ogiso, a distinguished inventor based in Tokyo, Japan, has made significant contributions to the field of pattern inspection technology. With a portfolio of ten patents, he has dedicated his career to advancing methods and apparatuses that enhance the accuracy and reliability of semiconductor manufacturing processes.

Latest Patents

Ogiso's recent innovations include two prominent patents that focus on sophisticated pattern inspection techniques. The first is a **Pattern Inspection Apparatus and Method**, designed to perform detailed inspection based on a Scanning Electron Microscope (SEM) image. This invention accurately measures distortion in the SEM image and adjusts the design data accordingly, ensuring precise correspondence between the SEM image and the design data. Additionally, it calculates a matching rate between the design patterns and the SEM image patterns.

The second noteworthy invention is a **Defect Review Apparatus and Defect Review Method**. This apparatus employs an electron scanning mechanism that systematically irradiates and scans the sample's surface, utilizing four electron detectors positioned at 90-degree intervals around the beam's optical axis. The signal processing unit generates multiple images from different angles, enabling effective defect detection, particularly for line-and-space patterns by performing a subtract operation between the images taken from two predetermined directions.

Career Highlights

Throughout his career, Yoshiaki Ogiso has been associated with reputable corporations, including Advantest Corporation and Fujitsu Corporation. His work in these companies has enabled him to refine his expertise in semiconductor technologies and pattern inspection methodologies.

Collaborations

Ogiso has collaborated with prominent professionals in the industry, including colleagues Jun Matsumoto and Tsutomu Murakawa. Their collective efforts in research and development have contributed to advancements in pattern inspection technologies and semiconductor manufacturing.

Conclusion

With his innovative spirit and technical prowess, Yoshiaki Ogiso continues to be a pivotal figure in the field of pattern inspection. His inventions not only address current challenges in semiconductor manufacturing but also pave the way for future advancements in technology. His contributions exemplify the vital role of inventors in driving innovation and improving industrial processes.