The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Sep. 09, 2010
Applicants:

Jun Matsumoto, Tokyo, JP;

Yoshiaki Ogiso, Tokyo, JP;

Inventors:

Jun Matsumoto, Tokyo, JP;

Yoshiaki Ogiso, Tokyo, JP;

Assignee:

Advantest Corp., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern measuring apparatus includes: an electron irradiating unit for radiating an electron beam onto a sample while scanning; an image data acquiring unit for acquiring an image of a pattern on the basis of secondary electrons generated from the sample; a measurement region setting unit for setting paired measurement regions each including a pattern edge in the image; and a controlling unit for calculating a distance between pattern edges in the paired measurement regions by detecting a shape of the pattern edge. The control unit calculates edge characteristic curves by finding moving averages of edge profiles and defines the positions of peak values of the edge characteristic curves as edge positions of the patterns in the measurement regions.


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