The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

Oct. 14, 2011
Applicants:

Yoshiaki Ogiso, Tokyo, JP;

Isao Yonekura, Tokyo, JP;

Inventors:

Yoshiaki Ogiso, Tokyo, JP;

Isao Yonekura, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01); H01J 37/24 (2006.01); G06T 7/00 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); H01J 2237/2817 (2013.01); H01J 2237/24495 (2013.01); H01J 2237/221 (2013.01); H01L 22/12 (2013.01);
Abstract

A defect review apparatus includes: an electron scanning part which irradiates and scans an electron beam over an observation region on a surface of a sample; four electron detectors arranged around the optical axis of the electron beam with 90° intervals; and a signal processing unit which generates multiple pieces of image data of the observation region on the basis of detection signals from the electron detectors, the multiple pieces of image data respectively taken in different directions. When a pattern in the observation region is a line-and-space pattern, the defect inspection unit performs defect detection on the basis of a subtract between two pieces of the image data respectively taken in two predetermined directions with the optical axis of the electron beam in between.


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