Yoshiaki Hattori

Title: Yoshiaki Hattori: Innovator in Charged Beam Lithography

Introduction

Yoshiaki Hattori is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of charged beam lithography, holding a total of 3 patents. His innovative work has advanced the precision and efficiency of pattern writing methods used in various applications.

Latest Patents

Hattori's latest patents include a pattern writing method and a charged beam lithography system. The pattern writing method acquires the area of a pattern segment located in each of a plurality of small regions obtained by dividing a region on which a pattern is to be written. This method ensures highly-precise proximity effect correction, contributing to the improvement of writing precision for LSI patterns. The charged beam lithography system features a charged particle gun for generating charged beams, along with a main and sub-deflecting system for deflecting these beams. This system is designed to write desired patterns on a substrate while continuously moving a stage, utilizing real-time proximity effect correction to optimize dosage for each stripe.

Career Highlights

Yoshiaki Hattori works at Kabushiki Kaisha Toshiba, where he has been instrumental in developing advanced lithography technologies. His expertise in charged beam systems has positioned him as a key figure in the field, driving innovation and enhancing the capabilities of lithographic processes.

Collaborations

Hattori collaborates with notable coworkers, including Mitsuko Shimizu and Takayuki Abe. Their combined efforts contribute to the ongoing advancements in charged beam lithography and related technologies.

Conclusion

Yoshiaki Hattori's contributions to charged beam lithography and pattern writing methods highlight his role as an influential inventor in the field. His innovative patents and work at Toshiba continue to shape the future of lithographic technology.