Yoon Young Koo

Title: Yoon Young Koo: Innovator in CMP Slurry Composition

Introduction

Yoon Young Koo is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patents. With a total of 2 patents, Koo has focused on enhancing the efficiency and effectiveness of polishing tungsten pattern wafers.

Latest Patents

Koo's latest patents include a CMP slurry composition for polishing tungsten pattern wafers and a method of polishing tungsten pattern wafers using the same. The CMP slurry composition features a solvent, which can be either a polar or non-polar solvent, along with an abrasive agent and a biocide. The abrasive agent consists of silica modified with a silane containing two or three nitrogen atoms. Additionally, the biocide is a compound of a specific formula designed to enhance the polishing process. Another patent details a similar CMP slurry composition, but this time the abrasive agent includes silica modified with an amino silane that contains three nitrogen atoms.

Career Highlights

Yoon Young Koo is currently employed at Samsung SDI Co., Inc., where he continues to develop innovative solutions in the field of semiconductor manufacturing. His work has been instrumental in advancing the technology used in polishing processes, which are critical for the production of high-quality semiconductor devices.

Collaborations

Koo has collaborated with several talented individuals in his field, including Eui Rang Lee and Won Jung Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Yoon Young Koo's contributions to CMP slurry compositions have positioned him as a key figure in the semiconductor industry. His innovative patents reflect his commitment to advancing technology and improving manufacturing processes.