This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Semes Co., Ltd.. Active years: 2021-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Cheonan-si, KR (2021 - 2023)
- Chungcheongnam-do, KR (2023 - 2024)
Company Filing History:
Years Active: 2021-2024
Title: **Innovator Spotlight: Yoon Ok Jang**
Introduction
Yoon Ok Jang, based in Cheonan-si, South Korea, is a notable inventor with a portfolio of four patents. His inventions are primarily focused on enhancing substrate processing techniques, making significant strides in the field of materials science and engineering.
Latest Patents
Yoon's latest innovations include a "Substrate Processing Apparatus and the Method Thereof," which aims to improve yield by minimizing stain occurrences. This method involves creating multiple ink patterns on a substrate using various nozzles and adjusting the ink discharge based on calculated densities of these patterns. Another innovative patent is the "Apparatus for Correcting Impact Point of Ink and System for Treating Substrate with the Apparatus." This technology automates the measurement and correction of ink impact points on a substrate, enhancing precision through a coordinate system displayed on the substrate.
Career Highlights
Yoon Ok Jang's career is marked by his commitment to improving substrate processing technologies, reflecting his dedication to innovation in this domain. His contributions have significantly promoted efficiency and quality in substrate treatment processes.
Collaborations
Throughout his career, Yoon has worked closely with talented individuals such as Hyun Min Lee and Jun Seok Lee. Their collaborative efforts have undoubtedly enriched the research and development processes at Semes Co., Ltd., where Yoon currently serves.
Conclusion
Yoon Ok Jang stands out as an influential inventor within the materials processing industry. His innovative patents and collaborative spirit contribute to advancements that have the potential to transform substrate processing techniques, reinforcing his status as a key figure in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
