Yong Xiang Lim

Title: Yong Xiang Lim: Innovator in Semiconductor Processing Technology

Introduction

Yong Xiang Lim is a notable inventor based in Singapore, recognized for his contributions to semiconductor processing technology. He holds a patent that showcases his innovative approach to enhancing the efficiency of semiconductor manufacturing processes.

Latest Patents

Yong Xiang Lim has been granted a patent for a "Multi-pressure bipolar electrostatic chucking." This invention involves exemplary semiconductor processing systems that include a processing chamber, a power supply, and a chuck that is partially located within the processing chamber. The chuck features a body that defines a vacuum port, along with first and second coplanar electrodes embedded within the chuck body and connected to the power supply. In certain examples, these coplanar electrodes consist of concentric electrodes that create a concentric gap in between. The semiconductor processing methods associated with this patent may involve activating the power supply for the electrostatic chuck to secure a semiconductor substrate on the chuck body, as well as activating the vacuum port defined by the electrostatic chuck body. This technology allows for processing at increased pressure, while also enabling other processes to occur at reduced pressure with increased chucking voltage.

Career Highlights

Yong Xiang Lim is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering solutions. His work at Applied Materials has positioned him as a key player in advancing semiconductor technologies.

Collaborations

Yong Xiang Lim has collaborated with notable colleagues, including Jian Li and Dmitry A Dzilno, contributing to the development of innovative solutions in semiconductor processing.

Conclusion

Yong Xiang Lim's contributions to semiconductor processing technology through his patent on multi-pressure bipolar electrostatic chucking exemplify his innovative spirit and dedication to advancing the field. His work continues to influence the efficiency of semiconductor manufacturing processes.