Yong-Won Lee

Title: Yong-Won Lee: Innovator in Magnetic Media Patterning

Introduction

Yong-Won Lee is a prominent inventor based in San Jose, CA, known for his contributions to the field of magnetic media patterning. With a total of 3 patents, he has made significant advancements in the technology that underpins magnetic substrates.

Latest Patents

One of Yong-Won Lee's latest patents is titled "Resist fortification for magnetic media patterning." This invention provides a method and apparatus for forming magnetic media substrates. A patterned resist layer is formed on a substrate that has a magnetically susceptible layer. A conformal protective layer is then created over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate undergoes an energy treatment where energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist. This process impacts the magnetically susceptible layer and modifies its magnetic properties. Afterward, the patterned resist and conformal protective layers are removed, resulting in a magnetic substrate that has a pattern of magnetic properties with a topography that remains substantially unchanged.

Career Highlights

Yong-Won Lee is currently employed at Applied Materials, Inc., where he continues to innovate in the field of magnetic media. His work has been instrumental in advancing the technology used in magnetic substrates, making significant contributions to the industry.

Collaborations

Yong-Won Lee has collaborated with notable colleagues, including Li-Qun Xia and Christopher Dennis Bencher, further enhancing the innovative environment at Applied Materials, Inc.

Conclusion

Yong-Won Lee's work in magnetic media patterning exemplifies the spirit of innovation and dedication to advancing technology. His patents and collaborations reflect his commitment to improving magnetic substrate technology.