The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Jul. 28, 2011
Christopher D. Bencher, San Jose, CA (US);
Roman Gouk, San Jose, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
Li-qun Xia, Cupertino, CA (US);
Yong-won Lee, San Jose, CA (US);
Matthew D. Scotney-castle, Morgan Hill, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Peter I. Porshnev, Poway, CA (US);
Christopher D. Bencher, San Jose, CA (US);
Roman Gouk, San Jose, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
Li-Qun Xia, Cupertino, CA (US);
Yong-Won Lee, San Jose, CA (US);
Matthew D. Scotney-Castle, Morgan Hill, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Peter I. Porshnev, Poway, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.