Yong-Cheng Lin

Title: Yong-Cheng Lin: Innovator in Optical Proximity Correction

Introduction

Yong-Cheng Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of optical proximity correction (OPC) with a focus on integrated circuit design. With a total of 2 patents, Lin's work has advanced the methodologies used in semiconductor manufacturing.

Latest Patents

Lin's latest patents include innovative methods for enhancing the accuracy of integrated circuit designs. The first patent, titled "Target point generation for optical proximity correction," describes a computer processing system that receives a design pattern for an integrated circuit. This system applies a function to generate a model contour, creates multiple OPC target points along the contour, and adjusts the design pattern accordingly. The second patent, "Fracture aware OPC," outlines a method for preparing data to form a mask. This method involves setting dissection points at the main feature and arranging them symmetrically, ensuring precise separation and correction of segments during the OPC convergence simulation.

Career Highlights

Yong-Cheng Lin is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His expertise in optical proximity correction has positioned him as a valuable asset in the development of advanced manufacturing techniques.

Collaborations

Lin has collaborated with notable colleagues, including Yu-Po Tang and Wen-Chun Huang. These partnerships have fostered a collaborative environment that enhances innovation and problem-solving in their projects.

Conclusion

Yong-Cheng Lin's contributions to optical proximity correction demonstrate his commitment to advancing semiconductor technology. His innovative patents and collaborative efforts continue to influence the industry positively.