Taiwan Semiconductor Manufacturing Comp. Ltd.

Yong-Cheng Lin

Ru-Gun Liu

Wen-Chun Huang

Yu-Po Tang

Ming-Hui Chih

Wen-Li Cheng

Chia-Ping Chiang

Ping-Chieh Wu

Nian-Fuh Cheng

Sheng-Wen Lin

Chien-Fu Lee

A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.

Target point generation for optical proximity correction

The present disclosure describes an OPC method of preparing data for forming a mask. The method includes setting a plurality of dissection points at the main feature and further includes setting a target point at the main feature. The method includes arranging the two dissection points crossing the main feature symmetrically each other. The method includes separating two adjacent dissection points at one side of the main feature by a maximum resolution of the mask writer. The method includes dividing the main feature into a plurality of segments using the dissection points. The method includes performing an OPC convergence simulation to a target point. The method includes correcting the segments belonging to an ambit of the target point and further includes correcting the segment shared by two ambits.

Fracture aware OPC

Growing community of inventors

Hsinchu, Taiwan

Yong-Cheng Lin