Tokyo, Japan

Yoneichi Ogahara


Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1999-2006

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2 patents (USPTO):Explore Patents

Title: Yoneichi Ogahara: Innovator in Plasma Processing Technology

Introduction

Yoneichi Ogahara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of etching systems used in various applications.

Latest Patents

Ogahara's latest patents include an insulation-film etching system and a substrate holder for a plasma processing system. The insulation-film etching system is designed to etch an insulator film on a substrate using a species produced in plasma. This innovative apparatus features a process chamber, a substrate holder, a gas introduction line, a plasma generator, and a transfer mechanism. The system is capable of introducing a gas with a cleaning function to remove deposited films, ensuring a clean etching process. The control unit manages the sequence of operations, allowing for cleaning after etching.

The substrate holder for a plasma processing system aims to eliminate variations in process characteristics by regulating the temperature of a characteristic correction ring. This holder maintains the substrate in planar contact while performing the desired plasma process. It includes a substrate temperature regulation mechanism and a ring cooling mechanism to prevent heat accumulation, ensuring consistent performance.

Career Highlights

Yoneichi Ogahara is currently employed at Anelva Corporation, where he continues to develop innovative solutions in plasma processing technology. His expertise and dedication to research have positioned him as a key figure in his field.

Collaborations

Ogahara has collaborated with notable coworkers, including Yasumi Sago and Masanori Miyamae. Their combined efforts contribute to the advancement of technology within their organization.

Conclusion

Yoneichi Ogahara's contributions to plasma processing technology through his patents and work at Anelva Corporation highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.

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