The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Dec. 04, 2002
Yasumi Sago, Tokyo, JP;
Yoneichi Ogahara, Tokyo, JP;
Masanori Miyamae, Tokyo, JP;
Anelva Corporation, Tokyo, JP;
Abstract
This application discloses an insulation-film etching system that etches an insulator film on a substrate by a species produced in plasma. The apparatus comprises a process chamber in which the etching process is carried out, a substrate holder that is provided in the process chamber and holds the substrate, a gas introduction line to introduce a gas having an etching function into the process chamber, a plasma generator to generate the plasma of the introduced gas, and a transfer mechanism to transfer the substrate into the process chamber and to transfer the substrate out of the process chamber. The gas introduction line is capable of introducing a gas having a cleaning function to remove a deposited film on an exposed surface in the process chamber, instead of the gas for the etching. The system comprises a control unit that carries out the sequence control. According as the sequence control, the cleaning is carried out after the etching.