Location History:
- Miyagi, JP (2015)
- Seidai, JP (2016)
Company Filing History:
Years Active: 2015-2016
Title: Yoko Noto: Innovator in Plasma Etching Technology
Introduction
Yoko Noto is a prominent inventor based in Seidai, Japan. She has made significant contributions to the field of semiconductor device manufacturing, particularly in plasma etching methods. With a total of 2 patents, her work has advanced the precision and efficiency of semiconductor fabrication processes.
Latest Patents
Yoko Noto's latest patents include a plasma etching method and a plasma etching device. The plasma etching method enhances the selectivity of a silicon nitride film in relation to silicon oxide film or silicon. This method involves setting a predetermined pressure in a processing container while supplying a processing gas. By generating plasma through external energy and applying a specific bias to a holding stage, the method selectively etches the silicon nitride film. The processing gas used includes a plasma excitation gas, a CHxFy gas, and at least one oxidizing gas, with a flow rate of the oxidizing gas set to be 4/9 or greater.
Another notable patent focuses on an etching method that improves etching accuracy while securing selectivity when forming a dummy gate of a fin-type field effect transistor. In this method, the gate material deposited between multiple fins is etched using surface wave plasma. The etching process operates at a pressure of 50 mTorr (6.67 Pa) or more, with a power frequency applied to the mounting table ranging from 10 Hz to 200 Hz. The power is pulse-modulated to maintain a duty ratio of 50% or less.
Career Highlights
Yoko Noto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. Her innovative work has positioned her as a key figure in advancing plasma etching technologies.
Collaborations
Yoko collaborates with notable colleagues, including Hiroto Ohtake and Akinori Kitamura. Their combined expertise contributes to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Yoko Noto's contributions to plasma etching technology have significantly impacted the semiconductor industry. Her innovative methods and dedication to research continue to drive advancements in this critical field.