White Plains, NY, United States of America

Yohei Oishi


Average Co-Inventor Count = 7.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2019

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: Innovations of Yohei Oishi in Chemical Mechanical Planarization

Introduction

Yohei Oishi is a notable inventor based in White Plains, NY, with a focus on advancing technology in the field of semiconductor materials. Over his career, he has been granted a total of five patents, demonstrating his commitment to innovation and excellence in engineering.

Latest Patents

Among his latest contributions to the field is a significant patent that outlines a chemical mechanical planarization process specifically designed for indium phosphide materials. This process involves forming openings within a dielectric layer situated on a substrate. Within these openings, indium phosphide material is epitaxially grown, extending above the topmost surface of the dielectric layer. The inventive aspects of this patent include a special slurry composition that polishes the indium phosphide selectively relative to the dielectric layer, featuring an abrasive, at least one acidic pH modulator, and an oxidizer that minimizes the generation of phosphine gas.

Career Highlights

Throughout his professional journey, Yohei Oishi has worked with notable companies such as IBM (International Business Machines Corporation) and JSR Corporation. His roles in these organizations have been pivotal as he sought to refine processes and enhance the performance of semiconductor materials.

Collaborations

Oishi has collaborated with several esteemed colleagues, including Tatsuyoshi Kawamoto and Mahadevaiyer Krishnan. These partnerships have allowed for a rich exchange of ideas and advancements that have led to significant progress in their respective fields.

Conclusion

In conclusion, Yohei Oishi's contributions to the field of chemical mechanical planarization and indium phosphide technology highlight his innovative spirit and technical expertise. His patents reflect a deep understanding of materials science and a dedication to improving semiconductor processing techniques. Oishi’s work continues to influence advancements in technology and will likely pave the way for future innovations.

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