Yinuo Pan

Title: Yinuo Pan: Innovator in OPC Modeling Methods

Introduction

Yinuo Pan is a notable inventor based in Zhejiang, China. He has made significant contributions to the field of optical modeling, particularly through his innovative patent related to OPC (Optical Proximity Correction) modeling methods. His work is essential for advancing photolithography techniques used in semiconductor manufacturing.

Latest Patents

Yinuo Pan holds a patent for an OPC modeling method. This method includes several steps: determining optical model parameters and resist model parameters, obtaining multiple parameter combinations through stochastic selection, performing photolithography simulations, and calculating RMS values of differences between simulated and etched critical dimensions (CDs). The process also involves evaluating values according to the Pareto principle and applying a genetic algorithm to optimize parameter combinations. This iterative approach continues until a predetermined number of iterations is reached, ultimately using the highest prioritized parameter combinations for OPC modeling.

Career Highlights

Yinuo Pan is currently employed at Hefechip Corporation Limited, where he applies his expertise in optical modeling. His innovative approach to OPC modeling has positioned him as a key player in the semiconductor industry. His work not only enhances the efficiency of photolithography but also contributes to the overall advancement of semiconductor technology.

Collaborations

Yinuo Pan collaborates with talented individuals such as Eric S Parent and Yingfang Wang. Their combined expertise fosters a productive environment for innovation and development in their respective fields.

Conclusion

Yinuo Pan's contributions to OPC modeling methods exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in photolithography and optical modeling techniques.