Yingli Rao

Title: Innovations by Yingli Rao in Semiconductor Technology

Introduction

Yingli Rao is a prominent inventor based in Palo Alto, CA, known for his significant contributions to semiconductor technology. With a total of 5 patents, he has made remarkable advancements in the field, particularly in etching methods for semiconductor devices.

Latest Patents

One of his latest patents is titled "Non-conformal high selectivity film for etch critical dimension control." This invention describes a non-conformal, highly selective liner for etch methods in semiconductor devices. The method involves forming a film stack on a substrate, etching the film stack to create an opening, depositing a non-conformal liner in the opening, and selectively etching the film stack relative to the non-conformal liner to form a logic or memory hole. The non-conformal liner comprises one or more of boron, carbon, or nitrogen. Another notable patent focuses on "Methods of etching metal oxides with less etch residue." This patent outlines processing methods to etch metal oxide films with minimal etch residue, utilizing metal halide etchants and reductants to effectively remove the residue.

Career Highlights

Yingli Rao has established a successful career at Applied Materials, Inc., where he continues to innovate and develop new technologies in semiconductor manufacturing. His work has significantly impacted the efficiency and effectiveness of etching processes in the industry.

Collaborations

Throughout his career, Yingli has collaborated with talented individuals such as Srinivas Gandikota and Susmit Singha Roy, contributing to various projects and advancements in semiconductor technology.

Conclusion

Yingli Rao's contributions to semiconductor technology through his innovative patents and work at Applied Materials, Inc. highlight his role as a leading inventor in the field. His advancements in etching methods continue to shape the future of semiconductor manufacturing.