Yinghui Guo

Title: **Yinghui Guo: Innovating Dry Etching Technology**

Introduction

Yinghui Guo, an inventor based in Sichuan, China, has made significant contributions to the field of dry etching technology. With a total of four patents to his name, Guo's work has focused on creating innovative solutions that enhance manufacturing processes and materials.

Latest Patents

Among Guo's latest patents is the "Ultra-large area scanning reactive ion etching machine and etching method thereof." This patent addresses advancements in dry etching technology, presenting a machine that features an injection chamber, an etching reaction chamber, a transition chamber, and an etching ion generation chamber. The design allows for a sample holder to move in a scanning direction, enabling large-area, uniform, and efficient etching on samples.

Another noteworthy patent is the "Visible light-transparent and radiative-cooling multilayer film." This innovation consists of multiple film layers with varying thicknesses, achieving high visible light transmittance while providing radiative cooling. The unique arrangement of materials, distinguished by differences in dielectric constants, allows for the formation of resonant cavities that enhance the electric field, leading to improved cooling effects and cost efficiency.

Career Highlights

Yinghui Guo is affiliated with the Chinese Academy of Sciences, where his research and development efforts focus on advanced technologies that push the boundaries of current capabilities in the field. His commitment to innovation has positioned him as a key figure within the academy and the broader scientific community.

Collaborations

Collaboration is a vital part of Guo's work, and he has had the opportunity to work alongside esteemed colleagues such as Xiangang Luo and Mingbo Pu. These partnerships have fostered an environment of shared knowledge and expertise, propelling their projects to new heights.

Conclusion

Yinghui Guo stands out as an influential inventor in the realm of dry etching technology. His recent patents showcase his ability to innovate and address industry challenges effectively. Through collaboration and dedication to research, Guo continues to contribute to advancements that will shape the future of material processing and technology.