The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Feb. 10, 2017
The Institute of Optics and Electronics, the Chinese Academy of Sciences, Sichuan, CN;
Xiangang Luo, Sichuan, CN;
Yanqin Wang, Sichuan, CN;
Zeyu Zhao, Sichuan, CN;
Mingbo Pu, Sichuan, CN;
Ping Gao, Sichuan, CN;
Xiaoliang Ma, Sichuan, CN;
Xiong Li, Sichuan, CN;
Yinghui Guo, Sichuan, CN;
Abstract
The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit () configured to supply gas to a photoresist application unit (); wherein the photoresist application unit () comprises: a device cavity () enclosed by sidewalls, a bottom plate and a cover plate (), a rotation platform () configured to carry a substrate () and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit () configured to extract gas from the device cavity (). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.