Ying-Lung Wang

Title: Innovations of Ying-Lung Wang

Introduction

Ying-Lung Wang is a prominent inventor based in Tai-Chung County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on improving processes related to plasma enhanced chemical vapor deposition and barrier layers in semiconductor manufacturing.

Latest Patents

One of his latest patents is a "Bypass gas feed system and method to improve reactant gas flow and film deposition." This invention provides a method and reactant gas bypass system for carrying out a plasma enhanced chemical vapor deposition (PECVD) process. It aims to improve gas flow stability, avoiding unionized reactant precursors and thickness non-uniformities. The method includes supplying a reactant gas flow at a selected flow rate to bypass the plasma reactor chamber for a predetermined time, ensuring flow rate stability before redirecting the gas into the chamber for the plasma process.

Another notable patent is the "Nitride barrier layer to prevent metal (Cu) leakage issue in a dual damascene structure." This invention describes a method for forming a composite barrier layer that also functions as an etch stop in a damascene process. A SiC layer is deposited on a substrate in a CVD process chamber, followed by a silicon nitride layer. This composite barrier layer provides excellent resistance to copper oxidation and minimizes leakage current compared to conventional silicon nitride barrier layers.

Career Highlights

Ying-Lung Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor processes. His expertise in chemical vapor deposition and barrier layer technology has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including Yi-Lung Cheng and Mo-Chen Liao, contributing to advancements in semiconductor technology.

Conclusion

Ying-Lung Wang's innovative patents and contributions to semiconductor technology highlight his significant role in the industry. His work continues to influence the development of more efficient and reliable semiconductor manufacturing processes.