Ying Holden

Title: Innovations of Ying Holden in Semiconductor Technology

Introduction

Ying Holden is a prominent inventor based in San Jose, CA, known for his contributions to semiconductor technology. With a total of 2 patents, he has made significant advancements in the field, particularly in the area of etching processes.

Latest Patents

Ying Holden's latest patents focus on systems and methods for two-sided etch of a semiconductor substrate. These innovations involve generating reactive species that are flowed toward a substrate for processing. A diverter is strategically positioned between the generation chamber and the substrate. This allows a portion of the reactive species to flow through the diverter for processing the front of the substrate, while another portion is diverted around the substrate to the backside for processing. Additionally, a flow restricter is placed between the substrate and the exhaust system to increase the residence time of reactive species adjacent to the backside.

Career Highlights

Ying Holden is currently employed at Mattson Technology, Inc., where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of etching processes.

Collaborations

Ying has collaborated with notable colleagues such as Laizhong Luo and Rene George, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Ying Holden's contributions to semiconductor technology through his patents and work at Mattson Technology, Inc. highlight his role as a key innovator in the industry. His advancements in two-sided etching processes are paving the way for future developments in semiconductor manufacturing.