This inventor holds 3 USPTO granted patents. Top assignee: Worldwide Semiconductor Manufacturing Corporation. Active years: 2000.
Company Filing History:
Years Active: 2000
Title: Innovations of Ying-Chih Liu
Introduction
Ying-Chih Liu is a notable inventor based in Ping Tung Hsien, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on improving processes that enhance the efficiency and effectiveness of chemical-mechanical polishing operations.
Latest Patents
One of his latest patents is an "Installation for improving chemical-mechanical polishing operation." This invention features a polishing table with concentric rings that rotate in the same direction, allowing for a more uniform polishing of wafer surfaces. The design includes polishing pads mounted on each ring and a delivery tube that distributes slurry effectively. This innovation enables the use of materials with varying densities and roughness to achieve superior polishing results.
Another significant patent is the "Wafer cleaning device." This device consists of a looped belt forming an enclosed region with rollers at each end. The structure supports the rollers and maintains tension on the belt, allowing for a flat portion where a wafer can be cleaned. Additionally, a wafer-rotating device can be integrated to enhance the cleaning process.
Career Highlights
Ying-Chih Liu is currently employed at Worldwide Semiconductor Manufacturing Corporation, where he continues to develop innovative solutions in semiconductor technology. His expertise in chemical-mechanical polishing and wafer cleaning has positioned him as a valuable asset in the industry.
Collaborations
Ying-Chih Liu collaborates with his coworker, Sen-Nan Lee, to further advance their research and development efforts in semiconductor manufacturing.
Conclusion
Ying-Chih Liu's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his commitment to enhancing industry processes. His work continues to influence the efficiency of wafer polishing and cleaning operations.