The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Nov. 25, 1998
Applicant:
Inventors:
Sen-Nan Lee, Hsinchu, TW;
Ying-Chih Liu, Ping Tung Hsien, TW;
Assignee:
Worldwide Semiconductor Manufacturing Corp., Hsinchu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ;
U.S. Cl.
CPC ...
15102 ; 15 77 ;
Abstract
A wafer-cleaning device comprises a looped belt forming an enclosed region and a pair of rollers. Each roller occupies one end inside the enclosed region. Furthermore, a supporting structure located inside the enclosed region not only supports the rollers, but also maintains some tension on the belt. Thus, one portion of the belt is flat. The supporting structure is capable of supporting a wafer as well. In addition, a wafer-rotating device can be installed next to the edge of a wafer so that the wafer can rotate in a prescribed direction while the wafer surface is cleaned.