Company Filing History:
Years Active: 2020-2024
Title: Yihung Lin: Innovator in Semiconductor Technology
Introduction
Yihung Lin is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of layout design and exposure non-uniformity. With a total of 3 patents to his name, Lin continues to push the boundaries of innovation in his field.
Latest Patents
One of Lin's latest patents is titled "Method and system for reducing layout distortion due to exposure non-uniformity." This method involves receiving a design layout that includes a feature extending in both a peripheral and a central region. The process determines compensation values associated with a pellicle assembly and the peripheral region based on exposure distribution in an exposure field of a workpiece. The design layout is then adjusted according to these compensation values. The modification of the feature's shape includes partitioning the peripheral region into compensation zones, where the feature consists of first portions in the respective zones and a second portion in the central region. The line widths of the first portions are reduced according to the compensation values, while the second portion remains uncompensated.
Another patent by Lin also focuses on reducing layout distortion due to exposure non-uniformity. This method, along with a non-transitory computer-readable storage medium and a system for adjusting a design layout, involves receiving a design layout that includes a feature in the peripheral region. It determines a first compensation value associated with the peripheral region based on exposure distribution and adjusts the design layout by modifying the shape of the feature according to this compensation value.
Career Highlights
Yihung Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the precision and efficiency of semiconductor manufacturing processes.
Collaborations
Lin has collaborated with notable colleagues such as Chi-Ta Lu and Chia-Hui Liao, contributing to various innovative projects within the semiconductor sector.
Conclusion
Yihung Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in layout design and exposure techniques, showcasing the importance of innovation in technology.