The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Jul. 23, 2020
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
Chi-Ta Lu, Yilan County, TW;
Chia-Hui Liao, Hsinchu, TW;
Yihung Lin, Hsinchu County, TW;
Chi-Ming Tsai, Taipei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 111/20 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 2111/20 (2020.01);
Abstract
A method, a non-transitory computer-readable storage medium and a system for adjusting a design layout are provided. The method includes: receiving a design layout including a feature in a peripheral region of the design layout; determining a first compensation value associated with the peripheral region according to an exposure distribution in an exposure field of a workpiece; and adjusting the design layout by modifying a shape of the feature according to the compensation value.