Yih-Shung Lin

Title: The Innovative Contributions of Yih-Shung Lin

Introduction

Yih-Shung Lin, based in Carrollton, TX, is a prominent figure in the field of semiconductor technology and has secured a remarkable portfolio of 23 patents. His inventive work primarily focuses on methods related to the fabrication of interlevel contacts, especially in semiconductor integrated circuits.

Latest Patents

Among his latest patents is a breakthrough method for fabricating interlevel contacts of aluminum/refractory metal alloys. This innovative method facilitates the formation of a contact opening through an insulating layer, whereby a layer of refractory metal or alloy is deposited over the integrated circuit chip. Subsequently, aluminum is deposited at an elevated temperature, leading to the creation of an aluminum/refractory metal alloy at the interface. This alloy formation allows for the expansion of metal within the contact opening, effectively filling it and ensuring a smooth upper contour of the aluminum layer.

Another significant patent developed by Lin is an aluminum contact structure for integrated circuits, which involves forming an aluminum contact through an insulating layer. The method includes creating an opening, followed by the formation of a barrier layer if required. Lin's innovative approach allows aluminum to flow into the contact and completely fill it, which is enhanced by depositing the aluminum over the refractory metal layer while maintaining vacuum conditions.

Career Highlights

Lin's extensive career includes significant contributions at reputable companies. He has worked with Sgs-Thomson Microelectronics Limited and STMicroelectronics GmbH, where he played a crucial role in advancing semiconductor technologies. His work has brought forth innovative solutions that enhance the efficiency and performance of integrated circuits.

Collaborations

Throughout his career, Yih-Shung Lin has collaborated with distinguished colleagues such as Fu-Tai Liou and Fusen E Chen. These partnerships have fostered a creative environment that has led to numerous advancements in semiconductor fabrication techniques.

Conclusion

Yih-Shung Lin's extensive patent portfolio and his contributions to semiconductor technology highlight his innovative spirit and dedication to advancing the field. His groundbreaking methods for fabricating interlevel contacts not only illustrate his technical proficiency but also pave the way for future developments in integrated circuits. As technology continues to evolve, Lin's work serves as a cornerstone for ongoing innovations in semiconductor manufacturing.