The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1998
Filed:
Nov. 24, 1997
Applicant:
Inventors:
Alex Kalnitsky, Grenoble, FR;
Yih-Shung Lin, Plano, TX (US);
Assignee:
STMicroelectronics, Inc., Carrollton, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438697 ; 438723 ; 216 38 ;
Abstract
A method for planarizing integrated circuit topographies, wherein, after a first layer of spin-on glass is deposited, a layer of low-temperature oxide is deposited before a second layer of spin-on glass.
Kalnitsky, Alex. (1998). Enhanced planarization technique for an integrated circuit (U.S. Patent No. 5837613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5837613
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile