Location History:
- Taoyuan, TW (2004 - 2006)
- Taoyuan County, TW (2006)
Company Filing History:
Years Active: 2004-2006
Title: Yi-Tsai Hsu: Innovator in Lithographic Processes
Introduction
Yi-Tsai Hsu is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of lithography, holding a total of 5 patents. His innovative approaches have advanced the manufacturing processes in the semiconductor industry.
Latest Patents
One of Yi-Tsai Hsu's latest patents is a lithographic process for multi-etching steps by using a single reticle. This invention provides a method where the develop step is performed next to a bake step after the photoresist layer has been exposed. This process results in a photoresist residue forming on the peripheral region around a transformed pattern of the photoresist. The thinner thickness of the photoresist residue compared to the photoresist layer allows it to be used as a mask for multi-etching steps. Another notable patent is the process of manufacturing a thin film transistor. This process includes forming a gate line on a substrate through initial exposure and development processes, followed by the formation of a source electrode, drain electrode, and semiconductor channel through subsequent exposure and development processes. An island-shaped transistor is created through further exposure and development, culminating in the formation of a protection layer with a contact hole and a pixel electrode that connects to the contact hole.
Career Highlights
Yi-Tsai Hsu has worked with notable companies such as Chunghwa Picture Tubes, Ltd. and Chungwha Picture Tubes, Ltd. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing.
Collaborations
Some of his coworkers include Chin-Tzu Kao and Yu-Chou Lee, who have collaborated with him on various projects throughout his career.
Conclusion
Yi-Tsai Hsu's innovative work in lithographic processes has made a significant impact on the semiconductor industry. His patents reflect his dedication to advancing technology and improving manufacturing techniques.