The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Feb. 12, 2003
Da-yo Liu, Taipei, TW;
Chin-tzu Kao, Changhua County, TW;
Jui-chung Chang, Taichung County, TW;
Yi-tsai Hsu, Taoyuan County, TW;
Da-Yo Liu, Taipei, TW;
Chin-Tzu Kao, Changhua County, TW;
Jui-Chung Chang, Taichung County, TW;
Yi-Tsai Hsu, Taoyuan County, TW;
Chungwha Picture Tubes, Ltd., Taipei, TW;
Abstract
This invention provides a lithographic process for multi-etching steps by using single reticle, wherein the develop step is performed next to a bake step after the photoresist layer has been exposed, such that a photoresist residue is formed on the peripheral region around a transformed pattern of the photoresist. Because the photoresist residue has thinner thickness compared to the photoresist layer, this kind of developed photoresist layer can be used as the very mask for multi-etching steps.