Yi-Lin Fan

Title: Yi-Lin Fan: Innovator in Semiconductor Technology

Introduction

Yi-Lin Fan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work is essential in advancing the capabilities of semiconductor devices.

Latest Patents

Yi-Lin Fan holds a patent for a semiconductor device and method of manufacturing the same. This patent describes a cell region of a semiconductor device that includes a first and second isolation dummy gates extending along a first direction. The semiconductor device further includes a first gate extending along the first direction and positioned between the first and second isolation dummy gates. Additionally, it features a second gate extending along the first direction, located between the isolation dummy gates relative to a second direction that is perpendicular to the first direction. The device also comprises a first active region and a second active region, with the first active region extending in the second direction between the isolation dummy gates. Notably, the first and second active regions have different lengths in the second direction.

Career Highlights

Yi-Lin Fan is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technology and innovation in semiconductor manufacturing.

Collaborations

Some of Yi-Lin Fan's notable coworkers include Cheng-Yu Lin and Hui-Zhong Zhuang. Their collaboration in the field of semiconductor technology has further enhanced the development of innovative solutions.

Conclusion

Yi-Lin Fan's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor devices.