Shanghai, China

Yeqing Cui

This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Huali Microelectronics Corporation. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yeqing Cui: Innovator in MOM Capacitance Control

Introduction

Yeqing Cui is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, particularly in the area of capacitance control for metal-oxide-metal (MOM) capacitors. His innovative approach has led to the development of a unique method that enhances the precision of capacitance value control.

Latest Patents

Yeqing Cui holds a patent titled "Method and system for MOM capacitance value control." This patent describes a method that involves setting target thicknesses for metal layers, measuring the thickness of the current metal layer, and calculating capacitance variations related to that layer. The process ensures that the actual capacitance value aligns closely with the target capacitance value, thereby improving the performance of MOM capacitors.

Career Highlights

Yeqing Cui is currently employed at Shanghai Huali Microelectronics Corporation, where he applies his expertise in microelectronics. His work focuses on advancing technologies that are crucial for the development of modern electronic devices. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in his field.

Collaborations

Yeqing collaborates with talented colleagues such as Ran Huang and Jianning Deng. Together, they work on various projects that aim to enhance the efficiency and effectiveness of microelectronic components.

Conclusion

Yeqing Cui's contributions to the field of microelectronics, particularly through his patented method for MOM capacitance value control, highlight his role as an influential inventor. His work not only advances technology but also sets a foundation for future innovations in the industry.

Profile summary based on public USPTO records.
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