Shanghai Huali Microelectronics Corporation

Yeqing Cui

Ran Huang

Jianning Deng

A method for MOM capacitance value control is disclosed. The method comprises: S: setting a target thicknesses for each metal layers; S: after forming a current metal layer, measuring a thickness of the current metal layer; when the thickness of the current metal layer is equal to or less than a threshold value, then turning to step S; S: calculating multiple capacitance variations related to the current metal layer according to the thickness of the current metal layer; wherein each of the capacitance variation related to the current metal layer is between an actual capacitance value of a MOM capacitor combination associated with the current metal layer and a target capacitance value of the same MOM capacitor combination; S: calculating updated target thicknesses for all subsequent metal layers according to the capacitance variations related to the current metal layer.

Growing community of inventors

Shanghai, China

Yeqing Cui