Yeongeun Yook

Title: Yeongeun Yook - Innovator in Semiconductor Manufacturing

Introduction

Yeongeun Yook is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach focuses on improving the methods used in the production of semiconductor devices.

Latest Patent Applications

Yeongeun Yook has filed a patent application titled "METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE." This application outlines a method that includes sequentially forming an etch target film and an insulating film on a substrate. A first photoresist film is formed on the insulating film, followed by the creation of a first photoresist pattern that exposes a first region of the insulating film. A protective film is then formed to cover the first photoresist pattern and the first region of the insulating film. Subsequently, a second photoresist pattern is created, exposing a second region of the protective film. The protective film remains in place during the formation of the second photoresist pattern. The process includes forming a first trench by etching the etch target film using the first photoresist pattern and a second trench using the second photoresist pattern. Notably, the forming of the first trench occurs after the formation of the second photoresist pattern.

Conclusion

Yeongeun Yook is an emerging inventor in the semiconductor industry, with a focus on innovative manufacturing methods. His contributions may pave the way for advancements in semiconductor technology.