This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yen-Yu Kuo and Metallic Photoresists for Semiconductor Patterning.
Introduction
Yen-Yu Kuo is an inventor associated with Hsinchu, Taiwan, and Taiwan Semiconductor Manufacturing Co., Ltd. His patent work concerns organometallic photoresists designed for patterning semiconductor devices with extreme ultraviolet (EUV) or electron-beam radiation.
Latest Patents
Kuo is associated with 1 patent: “Photo ligand design for EUV or E-beam metallic photoresists.” The patent describes forming a photoresist layer over a substrate using an organometallic compound. The compound includes a metal core, at least one hydrolyzable ligand bonded to the core, and at least one photoacid-generator ligand. After selectively exposing the layer to radiation, the process develops it to create a pattern. This approach addresses the design of metallic photoresists for semiconductor manufacturing.
Career Highlights
Kuo’s listed patent work connects his inventive activity with semiconductor fabrication at Taiwan Semiconductor Manufacturing Co., Ltd. The disclosed method focuses on photoresist composition and pattern formation using EUV or electron-beam exposure.
Collaborations
Kuo’s listed coworker is An-Ren Zi, who is a woman. The provided information does not specify her role in the patent or the nature of their collaboration.
Conclusion
Yen-Yu Kuo’s patent highlights an approach to organometallic photoresist design that supports radiation-based patterning in semiconductor device manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile