Zhongli, Taiwan

Yen-Pu Hsu

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006-2007.


% Patents Active = 50.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Title: Yen-Pu Hsu: Innovator in Etching Operation Management

Introduction

Yen-Pu Hsu is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in etching operation management systems. With a total of 2 patents, Hsu's work is instrumental in enhancing manufacturing processes.

Latest Patents

Hsu's latest patents include innovative systems and methods for etching operation management. One of his patents focuses on a process controller that acquires line width data on processed wafers. It determines a first Critical Dimension (CD) bias by comparing the measured width to a target width. The system then calculates an adjusted target width based on etching durations and directs the etching tool to perform operations accordingly. Another patent involves a computer-implemented method for estimating manufacturing target bias. This method establishes a data set based on historical bias correlations and predicts manufacturing target bias for products across various tools.

Career Highlights

Yen-Pu Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in etching operations has positioned him as a key player in the development of advanced manufacturing techniques.

Collaborations

Hsu collaborates with talented coworkers, including Cheng Hsien Wei and Mei-Jen Wu, who contribute to the innovative environment at their workplace.

Conclusion

Yen-Pu Hsu's contributions to etching operation management systems reflect his dedication to advancing semiconductor manufacturing. His patents demonstrate a commitment to improving efficiency and precision in the industry.

Profile summary based on public USPTO records.
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