Yen-Hsu Chu

Title: Yen-Hsu Chu: Innovator in Photolithography Technology

Introduction

Yen-Hsu Chu is a prominent inventor based in Taipei, Taiwan. She has made significant contributions to the field of integrated circuit technology, particularly in photolithography processes. Her innovative work has led to the development of a unique patent that addresses critical challenges in the semiconductor industry.

Latest Patents

Yen-Hsu Chu holds a patent for a "Photolithography scattering bar structure and method." This patent provides an integrated circuit (IC) photo mask that includes a main feature of the IC, which has a plurality of sides. The design incorporates a plurality of assist features that are spaced from each other and from the main feature. Each assist feature is adjacent to one of the sides and has an elongated shape, which, when extended, intersects with at least another assist feature. These assist features serve as sub-resolution correction features to correct for optical proximity effects in photolithography processes. This innovation is crucial for enhancing the precision and efficiency of IC manufacturing.

Career Highlights

Yen-Hsu Chu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. Her work at this prestigious company has allowed her to apply her expertise in photolithography and contribute to advancements in semiconductor technology.

Collaborations

Yen-Hsu has collaborated with notable colleagues, including Chia-Cheng Chang and Wei-Kuan Yu. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Yen-Hsu Chu's contributions to photolithography technology exemplify her dedication to innovation in the semiconductor industry. Her patent and collaborative efforts highlight her role as a key player in advancing integrated circuit technology.