Taiwan Semiconductor Manufacturing Comp. Ltd.

Yen-Hsu Chu

Hua-Tai Lin

Chien Wen Lai

Chin-Min Huang

Chia-Cheng Chang

Cherng-Shyan Tsay

Tsai-Ming Huang

Wei-Kuan Yu

Provided is an integrated circuit (IC) photo mask. The IC photo mask includes a main feature of the IC, the main feature having a plurality of sides, and a plurality of assist features, the assist features being spaced from each other and spaced from the main feature, wherein each one of the assist features is adjacent to one of the sides, each one of the assist features has an elongated shape along a direction, whereby extending the shape in the direction would intersect at least another one of the assist features and the assist features are sub-resolution correction features for correcting for optical proximity effect in a photolithography process.

Photolithography scattering bar structure and method

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Taipei, Taiwan

Yen-Hsu Chu