Yen-Hao Liu

Title: Yen-Hao Liu: Innovator in Semiconductor Cleaning Technologies

Introduction

Yen-Hao Liu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in cleaning technologies. With a total of 4 patents to his name, Liu's innovations are crucial for maintaining the integrity of semiconductor production processes.

Latest Patents

Liu's latest patents include an onsite cleaning system and method designed to enhance the cleaning of tools used in semiconductor manufacturing. This cleaning device features a nozzle structure with a spray opening that directs a cleaning liquid towards the tool. Surrounding the nozzle is a cleaning pad that exposes the spray opening and includes a front surface aimed at cleaning the tool effectively. Additionally, the device incorporates a support structure with multiple gas openings to blow pressurized gas and vacuum openings to remove residual gas, liquid, and particles. This innovative design generates an air wall around the tool, minimizing contamination risks during the cleaning process.

Another notable patent involves a method of cleaning the wafer table of a photolithography system. During idle mode, a directed stream of air is introduced into the chamber of a wafer table in an EUV lithography system. This stream extracts particles from the surfaces of wafer chucks, ensuring a clean environment for semiconductor fabrication.

Career Highlights

Yen-Hao Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on developing advanced cleaning technologies that are essential for maintaining high standards in semiconductor manufacturing.

Collaborations

Liu collaborates with several talented individuals in his field, including Chueh-Chi Kuo and Li-Jui Chen, who contribute to the innovative projects at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Yen-Hao Liu's contributions to semiconductor cleaning technologies demonstrate his commitment to innovation and excellence in the industry. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and provide effective solutions to enhance production quality.