Taiwan Semiconductor Manufacturing Comp. Ltd.

Yen-Hao Liu

Li-Jui Chen

Chueh-Chi Kuo

Heng-Hsin Liu

Shao-Hua Wang

Shih-Yu Tu

Sung-Han Tsai

A cleaning device for cleaning particles from a tool includes a nozzle structure having a spray opening to spray a cleaning liquid in a first direction to the tool, a cleaning pad disposed around the nozzle structure, and a support disposed around the cleaning pad. The cleaning pad exposes the spray opening and includes a front surface facing in the first direction to clean the tool. The support includes multiple gas openings to blow a pressurized gas in the first direction to the tool, and multiple vacuum openings to suck residual gas, liquid and particles around the tool. An air wall around the tool is thus generated by a combination of operations performed by the multiple gas openings and the multiple vacuum openings to reduce or prevent contamination that might be caused by the cleaning device in the chamber.

Onsite cleaning system and method

In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Method of cleaning wafer table of photolithography system and method of manufacturing integrated circuit

Highly efficient automatic particle cleaner method for EUV systems

Growing community of inventors

Hsinchu, Taiwan

Yen-Hao Liu