Yen-Chin Hsiao

Title: Yen-Chin Hsiao: Innovator in Photosensitive Resin Technology

Introduction

Yen-Chin Hsiao is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of photosensitive resin compositions, with a focus on non-toxic and water-soluble materials. His innovative work has led to the development of two patents that enhance the functionality and safety of solder mask coatings.

Latest Patents

Yen-Chin Hsiao's latest patents include a "Water soluble photosensitive resin composition and film using same." This invention features a non-toxic water-soluble photosensitive resin composition that functions as a solder mask coating. It comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator, all of which are water-soluble or water-dispersible. The polymer and monomer contain multiple carbon-carbon double bonds, allowing them to polymerize into a dense cross-linking network structure upon exposure to ultraviolet radiation. Additionally, he has developed a "Photosensitive resin composition, and film and printed circuit board using same." This patent describes a non-reactive photosensitive resin composition that can be stored at room temperature. It includes a carboxylic acid-modified bisphenol epoxy (meth)acrylate, a photosensitive monomer, a photosensitive prepolymer, a photo-initiator, and a coloring agent. Similar to his previous invention, these components can polymerize to form a dense cross-linking network structure when exposed to ultraviolet radiation.

Career Highlights

Yen-Chin Hsiao is currently employed at Zhen Ding Technology Co., Ltd., where he continues to innovate in the field of photosensitive materials. His work has been instrumental in advancing the technology used in printed circuit boards and other electronic applications.

Collaborations

Yen-Chin has collaborated with notable colleagues, including Chen-Feng Yen and Shou-Jui Hsiang, who contribute to the innovative environment at Zhen Ding Technology Co., Ltd.

Conclusion

Yen-Chin Hsiao's contributions to the field of photosensitive resin technology demonstrate his commitment to innovation and safety in electronic materials. His patents reflect a significant advancement in the industry, paving the way for future developments.