Yeh-Chin Wang

Title: Yeh-Chin Wang: Innovator in Semiconductor Technology

Introduction

Yeh-Chin Wang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to surface topography measurement for lithography.

Latest Patents

Wang's latest patents include a method and system of surface topography measurement for lithography. This method involves providing a workpiece to a semiconductor apparatus, where the workpiece includes a material layer with a first strip containing a first plurality of exposure fields and a second plurality of exposure fields arranged alternately. The process includes scanning the first strip along a designated route to generate topography measurement data, which is then used to expose the respective fields accurately. This innovative approach enhances the precision of lithographic processes in semiconductor manufacturing.

Career Highlights

Yeh-Chin Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving measurement techniques that are crucial for the advancement of lithography in semiconductor fabrication.

Collaborations

Wang collaborates with notable colleagues such as Yang-Ann Chu and Yung-Yao Lee, contributing to a dynamic team that drives innovation in semiconductor technology.

Conclusion

Yeh-Chin Wang's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in lithography and measurement techniques, solidifying his reputation as a leading inventor.