This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignees: Sungkyunkwan University, Industry-University Cooperation Foundation Hanyang University. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2024-2026
Title: Innovations of Ye Eun Kim: Pioneering Dry Etching Techniques in Yongin-si
Introduction: Ye Eun Kim is a distinguished inventor based in Yongin-si, South Korea. With a focus on advanced manufacturing techniques, he has contributed notably to the field through his innovative approach to dry etching methods. With one patent to his name, he demonstrates a commitment to enhancing technology in his area of expertise.
Latest Patents: Ye Eun Kim's significant patent is titled "Dry etching method using potential control of grid and substrate." This method involves a two-step process where the first step adsorbs radicals into the surface of an etching target using plasma, while the second step employs ion-beams to desorb the surface atomic layer. This innovative etching technique enables precise control over materials in semiconductor manufacturing, showcasing Kim's inventive approach to enhancing the efficiency and effectiveness of the process.
Career Highlights: Ye Eun Kim works at the Research and Business Foundation of Sungkyunkwan University, where his research plays a vital role in developing novel technologies. His innovative mindset and technical expertise in dry etching methods have positioned him as a key figure in academia and research circles.
Collaborations: Throughout his career, Ye Eun Kim has collaborated with proficient colleagues, notably Geun Young Yeom, who also contributes to advancements in the field. Their combined expertise allows for the exploration of groundbreaking methodologies that push the boundaries of current technology.
Conclusion: Ye Eun Kim is a remarkable inventor whose work in dry etching methods illustrates the potential for innovation within the semiconductor industry. With his patent reflecting significant advancements, his efforts at the Research and Business Foundation of Sungkyunkwan University continue to inspire progress in the field. As he collaborates with talented individuals like Geun Young Yeom, the future of technological advancement in dry etching techniques looks promising.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile