Company Filing History:
Years Active: 1993-2017
Title: Yasushi Fukazawa: Innovator in Photometric and CVD Technologies
Introduction
Yasushi Fukazawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the fields of photometry and chemical vapor deposition (CVD) technology. With a total of two patents to his name, Fukazawa's work focuses on enhancing measurement precision and substrate support mechanisms.
Latest Patents
Fukazawa's latest patents include a photometric apparatus designed to improve measurement precision by optimizing the state of light incident to a sensor. Additionally, he has developed a substrate supporting apparatus for a CVD apparatus. This innovative apparatus features multiple support plates arranged in parallel to support several substrates during treatment. The plates are equipped with central openings of varying sizes, which are determined based on reactive gas conditions to ensure uniform thin film formation and appropriate impurity concentration.
Career Highlights
Throughout his career, Yasushi Fukazawa has worked with prominent companies such as ASM Japan K.K. and Sekonic Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Fukazawa has collaborated with notable coworkers, including Mitsutoshi Shuto and Minoru Ohsaki. Their combined expertise has likely fostered innovative solutions in their respective fields.
Conclusion
Yasushi Fukazawa's contributions to photometric and CVD technologies highlight his role as a significant inventor. His patents reflect a commitment to improving measurement precision and substrate support, showcasing his innovative spirit.