The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1993
Filed:
May. 21, 1991
Applicant:
Inventors:
Assignee:
ASM Japan K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118728 ; 118715 ; 118500 ;
Abstract
A substrate supporting apparatus having a plurality of support plates positioned in parallel for supporting a plurality of substrates to be treated. The plates (13), (23) and (33) have respectively central openings (14), (24) and (34) which differ in size, and have respectively a plurality of clips (15), (25) and (35) along the periphery of the opening to support a substrate above the opening. The sizes of said openings (14, 24, 34) are determined depending upon reactive gas condition (e.g., temperature, pressure, flow characteristics of reactive gas) so that a uniform thin film can be formed on each substrate and an impurity introduced into the thin film can have a suitable concentration.