Minoru Ohsaki

Title: Minoru Ohsaki: Innovator in Substrate Supporting Technology

Introduction

Minoru Ohsaki is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate supporting apparatuses, particularly in the context of chemical vapor deposition (CVD) technology. His innovative designs aim to enhance the efficiency and quality of thin film production.

Latest Patents

Ohsaki holds a patent for a substrate supporting apparatus for a CVD apparatus. This invention features a design with multiple support plates arranged in parallel to support several substrates during treatment. The plates are equipped with central openings of varying sizes, which are crucial for achieving uniform thin film formation. The sizes of these openings are determined based on reactive gas conditions, ensuring that the thin film has a suitable concentration of impurities.

Career Highlights

Minoru Ohsaki has dedicated his career to advancing technology in the semiconductor industry. His work at Asm Japan K.K. has positioned him as a key player in the development of innovative solutions for substrate support systems. His patent reflects his commitment to improving manufacturing processes and product quality.

Collaborations

Ohsaki has collaborated with notable colleagues, including Mitsutoshi Shuto and Yasushi Fukazawa. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Minoru Ohsaki's contributions to substrate supporting technology exemplify the impact of innovative thinking in the semiconductor industry. His patent demonstrates a commitment to enhancing the efficiency of thin film production, marking him as a significant figure in his field.