Location History:
- Tokyo, JP (1993)
- Tama, JP (2009 - 2011)
Company Filing History:
Years Active: 1993-2011
Title: Mitsutoshi Shuto: Innovator in Plasma Treatment Technologies
Introduction
Mitsutoshi Shuto is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of plasma treatment technologies, holding a total of 3 patents. His innovative approaches have advanced the methods used in plasma chemical vapor deposition (CVD).
Latest Patents
One of his latest patents is a "Method of plasma treatment using amplitude-modulated RF power." This method involves processing a substrate by plasma CVD, which includes forming a film on a substrate placed on a susceptor by applying RF power in the presence of a film-forming gas. Upon completion of this step, amplitude-modulated RF power is applied in the absence of a film-forming gas to reduce the floating potential of the substrate.
Another notable patent is the "DC bias voltage measurement circuit and plasma CVD apparatus comprising the same." This invention features a circuit designed to measure DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus. It includes various components such as terminals, resistances, and a condenser, all working together to ensure accurate measurements.
Career Highlights
Mitsutoshi Shuto is currently employed at Asm Japan K.K., where he continues to develop and refine his innovative technologies. His work has been instrumental in enhancing the efficiency and effectiveness of plasma treatment processes.
Collaborations
He collaborates with notable coworkers, including Yasuaki Suzuki and Yasushi Fukazawa, who contribute to his projects and innovations.
Conclusion
Mitsutoshi Shuto's contributions to plasma treatment technologies exemplify his dedication to innovation in the field. His patents reflect a commitment to advancing the science of plasma CVD, making him a significant figure in the industry.