Mie-ken, Japan

Yasuo Tane

USPTO Granted Patents = 8 

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 35(Granted Patents)


Location History:

  • Urayasu, JP (1995 - 1996)
  • Tokyo, JP (2001)
  • Yokkaichi, JP (2014)
  • Mie, JP (2014)
  • Mie-ken, JP (2012 - 2015)

Company Filing History:


Years Active: 1995-2015

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8 patents (USPTO):Explore Patents

Title: Yasuo Tane: Innovator in Semiconductor Manufacturing

Introduction

Yasuo Tane is a prominent inventor based in Mie-ken, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 8 patents. His innovative methods have advanced the technology used in semiconductor devices, showcasing his expertise and dedication to the industry.

Latest Patents

Among his latest patents, Tane has developed a method for manufacturing semiconductor devices. This method involves creating a semiconductor chip with electrode pads on one surface and a bonding layer on the opposite surface. The process includes applying a fillet-forming material to the outer edge of the chip's second major surface, ensuring a secure bond to the substrate. Another notable patent is for forming an adhesive layer and adhesive composition. This method selectively coats a surface with a thermosetting adhesive composition, which undergoes two distinct hardening reactions at different temperatures, enhancing the bonding process.

Career Highlights

Throughout his career, Yasuo Tane has worked with notable companies such as Kabushiki Kaisha Toshiba and Kyocera Chemical Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Tane has collaborated with esteemed colleagues, including Yukio Katamura and Atsushi Yoshimura. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Yasuo Tane's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of technology and manufacturing processes.

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