Tokyo, Japan

Yasuo Ohta

This inventor holds 5 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Rohm & Haas Electronic Materials LLC, Shipley Company LLC. Active years: 2002-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Ohta. Retrieved from https://idiyas.com/inventor/yasuo-ohta-9pdbfefw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 40.0


Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2002-2016

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5 patents (USPTO):Explore Patents

Title: Yasuo Ohta: Innovator in Electroplating Solutions

Introduction

Yasuo Ohta is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electroplating, particularly with tin and tin alloy solutions. With a total of 5 patents to his name, Ohta's work has had a notable impact on the industry.

Latest Patents

Ohta's latest patents focus on a tin or tin alloy electroplating solution. This innovative solution includes an additive obtained from the reaction product of glutaraldehyde and hydrocarbon compounds containing a hydroxyl group, along with amine compounds. The resulting tin or tin alloy plating solution incorporates this unique additive, enhancing its effectiveness.

Career Highlights

Throughout his career, Yasuo Ohta has worked with several notable companies, including Rohm & Haas Electronic Materials and Shipley Company. His experience in these organizations has allowed him to refine his expertise in electroplating technologies.

Collaborations

Ohta has collaborated with talented individuals in his field, including Motoya Shimazu and Yasushi Takizawa. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Yasuo Ohta's contributions to electroplating solutions demonstrate his commitment to innovation and excellence in his field. His patents and collaborations reflect a dedication to advancing technology in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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