Tokyo, Japan

Yasunori Yokoya

This inventor holds 3 USPTO granted patents. Top assignee: Hoya Corporation. Active years: 1998-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasunori Yokoya. Retrieved from https://idiyas.com/inventor/yasunori-yokoya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Yamanashi, JP (1998)
  • Tokyo, JP (2010)
  • Shinjuku-ku, JP (2014)

Company Filing History:


Years Active: 1998-2014

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3 patents (USPTO):Explore Patents

Title: Yasunori Yokoya: Innovator in Mask Manufacturing Technology

Introduction

Yasunori Yokoya is a prominent inventor based in Shinjuku-ku, Japan. He has made significant contributions to the field of mask manufacturing technology, holding a total of 3 patents. His work focuses on innovative methods that enhance the precision and efficiency of semiconductor device production.

Latest Patents

Yokoya's latest patents include a surface treatment method for a mask blank, a method of manufacturing a mask blank, and a method of manufacturing a mask. The surface treatment method involves using a treatment liquid to surface-treat a thin film on a mask blank, which is essential for forming a transfer pattern. The thin film is made from a material that can be etched using ion-based dry etching, with the treatment liquid containing an etching inhibitor at a concentration of 0.3 ppb or less. His manufacturing methods focus on achieving high positional accuracy and focus accuracy during the transfer of patterns to substrates, thereby minimizing deformation and enhancing the overall quality of semiconductor devices.

Career Highlights

Yokoya is currently employed at Hoya Corporation, a leading company in the optical and imaging technology sector. His innovative approaches have positioned him as a key figure in the development of advanced mask manufacturing techniques. His patents reflect a deep understanding of the complexities involved in semiconductor production and the importance of precision in this field.

Collaborations

Yokoya has collaborated with notable colleagues, including Hideo Kobayashi and Keishi Asakawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Yasunori Yokoya's contributions to mask manufacturing technology demonstrate his commitment to innovation and excellence. His patents not only enhance the efficiency of semiconductor production but also set new standards in the industry. His work continues to influence the future of technology in significant ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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